Absorption measurement of optical thin films under high power density with a Clo

A Closed Cavitymeasuring platform is built on the basis of a 1000 W-class direct current (DC)-discharge drived continuous-wave (CW) HF/DF chemical laser. On this platform, the absorption coefficients of optical thin films coated on the surfaces of monocrystalline silicon substrates, at the wavelength of 3.6–4.1 \mu m, is measured, when the power density on the surfaces of optical thin films reaches about 3.16 kW/cm2. The measuring principle and structure of the Closed Cavity is introduced. The t