854二十二

ASML_Reticle_manual_Final_2007

ASML2007出版的光罩操作手册，内容详尽，4x和5X都有涉及，对于刚入门的光刻工艺工程师（lithoPE）应该有所帮助

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4.8MB

2020-05-27 20:04

光刻原理Principles of Lithography

Lithographersatsemiconductorcompaniesareintegrators.Wecombineoptics, precisionmachines,photochemicals,andphotomasksintoworkingprocesses. Whilechipmakersoftengettheglory,thelensmakers,resistchemists,and toolmakersaretheunsungheroesofthemicroelectronicsrevo

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17.71MB

2020-05-18 01:49

Lithography Process Control_by Harry J.Levinson

Tounderstandthistexttherearesomeprerequisites.Abasicfoundationinlithographyscienceisassumed.TheSPIEHandbookonMicrolithography,MicromachiningandMicrofabrication.Volume1:Microlithographylprovidesasuitableintroduction.Itisalsoassumedthatthereaderhashadsomein

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13.09MB

2019-09-24 03:13

MicroLithography Secience and Technology_Second Edition_by Bruce M.Smith2007

The second edition of this volume is written not only as an introduction to the science and technology of microlithography, but also as a reference for those who with more experience so that they may obtain a wider knowledge and a deeper understanding of the field. The purpose of this update remains consistent with the first edition published in 1998 and edited by Dr. James R. Sheats and Dr. Bruce W. Smith. New advances in lithography have required that we update the coverage of microlithography systems and approaches, as well a s resist materials, processes, and metrology techniques. s resist materials, processes, and metrology techniques.

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15.64MB

2018-12-31 16:08