High damage threshold liquid crystal binary mask for laser beam shaping
In order to improve the damage threshold and enlarge the aperture of a laser beam shaper, photolithographic patterning technology is adopted to design a new type of liquid crystal binary mask. The inherent conductive metal layer of commercial liquid crystal electro-optical spatial light modulators is replaced by azobenzene-based photoalignment layers patterned by noncontact photolithography. Using the azobenzene-based photoalignment layer, a liquid crystal binary mask for beam shaping is fabrica
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